Iris Light’s photonic chip photodetectors combine wide spectral sensitivity — from VIS to SWIR to E-SWIR — with the scalability and precision of semiconductor manufacturing. Built using NanoBLACK™ photonic inks, these devices integrate directly onto diverse photonic platforms such as Si, SiN, and TFLN, transforming passive substrates into active, heterogeneous systems.

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Our architecture allows multiple color bands to be multiplexed on a single chip, opening the door to new system-level applications in optical communications, sensing, and imaging. By leveraging industry-standard foundry processes, Iris Light’s detectors achieve reliable, high-volume manufacturing while maintaining the low size, weight, and power (SWAP) performance required for advanced photonic systems.

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These photodetectors exemplify Iris Light’s vertically integrated approach, from nanomaterial synthesis to device fabrication, delivering the foundation for scalable, high-performance photonic circuits that extend what’s possible in modern semiconductor design.